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What are the commonly used process tanks for electroplating?

March 8th at 6:03pm
1. Main ingredients: sulfuric acid, chromic acid
 
2. Function: Forming fine pores on the surface of the product, making it easy to adsorb, reducing pitting, and avoiding phenomena such as insufficient adhesion and insufficient grid.
 
3、 Sensitization tank
 
1. Main ingredients: palladium acid, hydrochloric acid, stannous chloride
 
2. Function: To adsorb palladium ions on the surface of the product, reducing over plating and missed plating.
 
4、 Debonding tank
 
1. Main component: sulfuric acid
 
2. Function: Remove some substances from the previous slot, reduce over plating and missed plating.
 
5、 Chemical nickel tank
 
1. Main ingredient: Sodium Hypophosphite
 
2. Function: Make the surface of the product conductive, reduce over plating, missed plating, and pitting.
 
6、 Copper pyrophosphate tank
 
1. Main ingredients: ammonia water, copper coke, potassium coke
 
2. Function: To coat the surface of the product with phosphorous copper, reducing burning and pitting.
 
7、 Copper sulfate tank
 
1. Main ingredients: sulfuric acid, copper sulfate, chloride ions
 
2. Function: To coat the product with copper, reducing burning and pitting.
 
8、 All light nickel tank
 
1. Main ingredients: nickel sulfate, boric acid, nickel chloride
 
2. Function: To coat the product with nickel, reducing pitting and burning.
 
9、 Hexavalent chromium tank
 
1. Main ingredients: chromic acid, trivalent chromium, and acid ions
 
2. Function: The product is plated with chromium to reduce whitening and pitting.
 
10、 Water washing tank
 
1. Main ingredients: degreased water, hard water, pure water
 
2. Function: To make the product clean, convenient for inspection and use. The washing tank is the most commonly used tank
1. Main ingredients: sulfuric acid, chromic acid
 
2. Function: Forming fine pores on the surface of the product, making it easy to adsorb, reducing pitting, and avoiding phenomena such as insufficient adhesion and insufficient grid.